Computational Homology and Materials Science Workshop
Georgia Tech, Atlanta, GA, USA
February 2-4, 2006
This workshop at the Georgia Tech Conference Center was intended to bring together a select group of materials scientists, physicists, and applied mathematicians with an interest in quantifying the topology of microstructures and relating it to macroscopic properties of materials. In addition to providing a forum for discussing current and future applications of topological techniques, the workshop included tutorial lectures on computational homology and the publicly available software package CHomP. We wanted to give the participants ample opportunity to interact, share ideas, and explore the potential for future collaborations. For this reason, the number and length of the lectures was limited in order to provide adequate time for informal discussions.
Presentations
The following are the talk presentations of people who were attending the Workshop and were willing to share their materials with us. Note that all these materials are Copyright © 2006 by their authors and cannot be used without permission.
Computational Homology Tutorial, Part 1: Introduction to Homology [4.8M]—William D. Kalies (Florida Atlantic University, Department of Mathematical Sciences)
Computational Homology Tutorial, Part 2: Homology Algorithms [1M]—Marian Mrozek (Jagiellonian University, Institute of Computer Science)
Computational Homology Tutorial, Part 3: The CHomP Software [0.3M]—Pawel Pilarczyk (Georgia Institute of Technology, School of Mathematics)
Computational Homology Tutorial, Part 4: Accuracy of Homology Computations [1.5M]—Thomas Wanner (George Mason University, Department of Mathematical Sciences)
Utility of Metric and Topological Microstructural Attributes for Computer Simulations of Realistic Microstructures: Implications for Materials Design [68M]—Arun Gokhale (Georgia Institute of Technology, School of Materials Science and Engineering)
Structure Evolution and Release Behavior in Controlled Drug Delivery Devices [2.1M]—David M. Saylor (Division of Chemistry and Materials Science, FDA-CDRH-OSEL)
Morphological Characterization of Diblock Copolymer Problem and Topological Computation [6.2M]—Takashi Teramoto (Chitose Institute of Science and Technology)
Microstructure Response Isosurfaces and Their Metrics [19M]—Edwin R. Fuller, Jr. (National Institute of Standards and Technology)
Fast Deterministic Methods for Ascertaining the Evolution of Uncertain Parameters in Differential Equations [5.5M]—Donald Estep (Colorado State University)
The Significance of Connectivity in Microstructures [15M]—A.D. (Tony) Rollett (Materials Science & Engineering, Carnegie Mellon University)
Coarsening of Topologically Complex Systems: Experiments and Simulations [4.3M]—Peter Voorhees (Northwestern University)
Second-Order Microstructure Sensitive Design [4M]—Brent Adams and Denise Haverson (Brigham Young University)
Entropy Production Rate and Hierarchical Self-Organization [2.7M]—Yasumasa Nishiura (Laboratory of Nonlinear Studies and Computation, Research Institute for Electronic Science, Hokkaido University)
Homological Characterization of Patterns in Phase Separation and Spiral Defect Chaos [7.9M]—Thomas Wanner (George Mason University, Department of Mathematical Sciences)
Fingerprinting the structure and properties of polycrystalline materials with the grain boundary character distribution: PART 1 [6.5M]—Gregory S. Rohrer (Department of Materials Science and Engineering Carnegie Mellon University)
Fingerprinting the structure and properties of polycrystalline materials with the grain boundary character distribution: PART 2 [8.4M]—Gregory S. Rohrer (Department of Materials Science and Engineering Carnegie Mellon University)
Photographs
Acknowledgments
This workshop was supported by the Department of Energy, the College of Sciences, College of Engineering and the Vice Provost for Research at the Georgia Institute of Technology, and is related to DARPA's Topological Data Analysis program.
* Workshop logo picture courtsey Edwin R. Fuller, Jr. and David M. Saylor.